Deep Moisture Mask
+ Ultra-Cleansing Mask



all skin types

  • Przywraca prawidłowy poziom nawodnienia
  • Eliminuje zanieczyszczenia i zwęża pory

Apply a thick layer of Deep Moisture Mask on the areas which need moisturizing: cheeks and neck. Leave till absorbed. At the same time apply Ultra Clean mask where the skin is excessively oily (T-zone) and leave for 10-15 minutes till it dries. Rinse off with lukewarm water and apply moisturising cream.

Deep Moisture Mask: Aqua, Aloe Barbadensis Leaf Juice, Hydrogenated Polydecene, Glyceryl Stearate, PPG-3 Benzyl Ether Myristate, Isononyl Isononanoate, Glycerin, PEG-100 Stearate, Persea Grassima (Avocado) Oil, Stearic Acid, Cyclopentasiloxane, Cetearyl Alcohol, Dimethicone, Sodium Hyaluronate, Sodium Polyacrylate, Ethylhexylglycerin, Phenoxyethanol, Parfum, Geraniol, Hydroxyisohexyl 3-Cyclohexene Carboxaldehyde, Butylphenyl Methylpropional, Linalool, Citronellol, Limonene, Sodium Chloride, CI 19140, CI 42090.

Ultra Clean Mask: Aqua, Kaolin, Glycerin, Magnesium Aluminum Silicate, Betaine, Methylpropanediol, Aloe Barbadensis Leaf Juice, Allantoin, Panthenol, Charcoal Powder, Eucalyptus Globulus Leaf Oil, Xanthan Gum, Phenoxyethanol, Ethylhexylglycerin, Citric Acid, Diazolidinyl Urea.

Deep Moisture & Ultra Clean is a perfect solution for combination skin with its oily T-zone and dry cheeks.

Our Deep Moisture Mask restores the optimal moisture level in deep skin layers. The natural Aloe Vera Juice increases skin hydration and stimulates its cellular renewal. Hyaluronic Acid maintains the optimal moisture level and restores the elasticity and smoothness of the skin.

Based on the Natural Kaolin Clay, Ultra-Cleansing Mask eliminates toxins from the skin pores, leaving them clean and tight. Due to Active Charcoal, the mask removes impurities, prevents appearance of blackheads and regulates sebum production.